Dear Kurt
Thank you for your reply. I also tried processing on Topspin 3.0 and
Topspin 2.1, but I observed same diffusion coefficient.
The problem come from Topspin 3.0 on spectrometer. In the case of
Topspin 2.1 on spectrometer,the diffusion coefficient is 2.0 x 10-9 m2/s.
I am feeling the problem come from the process of the formation of
difflist on TopSpin 3.0. Recently,we bought a new AV500 spectrometer and
TopSpin 3.0. Bruker engineer said the new type of spectrometer can not
operate on TopSpin 2. The unit of pulse power also changed to W(watt) from
dB.
The similar diffusion coefficient (1.4 x 10-9 m2/s) was observed in
Bruker Japan application office by TopSpin3.0 on spectrometer. But they
could not solve the problem.
Thanks for your info
>
> Takahiro Kusukawa
>
> Department of Chemistry and Materials Technology
> Kyoto Institute of Technology
Kyoto, Japan
> If I put in a nominal gradient strength of 54.5 G/cm in topspin 3.1, I get a
> diffusion value of 2.12x10-9 using ledbpgp2s sequence and using topspin 3.1 as
> a satellite station for processing since I have an AV I and am using topspin
> 2.1pl6 on the spectrometer. The value in the gradient_calib on the
> spectrometer is 5.35 G/mm.
>
>
> Best Regards,
> Kurt
> The Lubrizol Corporation • Senior Fellow, Applied Science • phone 440 347 2026
> • BB 440 364 9006• kurt.wollenberg_at_lubrizol.com
> <mailto:kurt.wollenberg_at_lubrizol.com>
>
>
> From: Takahiro Kusukawa [mailto:kusu_at_kit.ac.jp]
> Sent: Tuesday, November 15, 2011 6:54 PM
> To: ammrl_at_ammrl.org
> Subject: AMMRL: Diffusion coefficient on Topspin 3.0
>
> Dear all,
> I have problem on diffusion coefficient measurement using Bruker TopSpin 3.0
> p.l.2.
> The diffusion coefficient of H20 in D2O was 1.6 x 10-9 m2/s by DOSY
> experiment.
> However,2.0 x 10-9 m2/s was observed using TopSpin 2 or Xwinnmr.
> Gradient strength calibration also showed strange result using TopSpin 3.0.
> After gradient calibration, the diffusion coefficient was 1.7 x 10-9 m2/s.
> Does anybody know this?
>
> Thanks for any info
>
> Takahiro Kusukawa
>
> Department of Chemistry and Materials Technology
> Kyoto Institute of Technology
> Kyoto, Japan
>
>
Received on Thu Nov 17 2011 - 15:38:58 MST